Focusing on Efficient InP Polishing | Kousei Seimitsu Invites You to Meet in Wuxi

01 Four Core Products Debut at the Indium Phosphide Exhibition
As Indium Phosphide (InP) materials are increasingly applied in high-speed optical communications, optical chips, and compound semiconductor fields, the lapping and polishing processes place higher demands on processing efficiency, surface quality, process stability, and consumable lifespan.
At this Wuxi exhibition, BOSI Kousei Seimitsu Technology Co., Ltd. will prominently display four core products for the InP material polishing process, providing customers with comprehensive solutions from rough polishing and backside polishing processes, fine polishing, to polishing pad selection.
02 KSTP-IP80 Series Alumina Polishing Slurry
Efficient rough polishing and backside polishing, balancing removal efficiency and surface quality
The KSTP-IP80 series is an alumina polishing slurry independently developed by Kousei Seimitsu for rough polishing and backside polishing processes of materials such as InP.
The product uses nano-grade alumina and can achieve high material removal efficiency while ensuring processing surface quality. According to existing test results, the maximum removal amount can reach about 4μm/min, helping to shorten rough polishing and backside polishing processing time and improve overall production efficiency.
KSTP-IP80 series alumina polishing slurry product image:

Actual application effects:
Suitable for rapid thinning and processing of InP materials, providing a good surface foundation for subsequent fine polishing while improving removal efficiency.
Related product parameters:

For sample testing, please contact Engineer Wang at 13312961176 (same as WeChat).
03 KSTP-SP20 Silica Polishing Slurry
Optimized surface quality, meeting fine polishing needs
KSTP-SP20 is a silica polishing slurry independently developed by Kousei Seimitsu, mainly applied to the fine polishing process of materials such as InP.
The product uses nano-grade silica and can achieve good polishing surface results, suitable for fine polishing or surface optimization processes after rough polishing. It must be used together with the A agent.
KSTP-SP20 series silica polishing slurry product image:

Actual application effects:
Helps improve the surface quality of InP materials, enhancing surface uniformity and finish, and providing more stable surface conditions for subsequent cleaning, inspection, and device processing.
Related product parameters:

For sample testing, please contact Engineer Wang at 13312961176 (same as WeChat).
04 TORAY KS09 Backing Pad
Stable support, improving polishing process consistency
KS09 is a black backing pad developed by Japan's TORAY, suitable for the polishing process stage of materials such as InP.
It has good rebound rate, compression performance, and pore structure, providing a stable contact state during the polishing process and meeting the requirements of conventional InP polishing processes.
TORAY KS09 backing pad product image:

Actual application effects:
Can improve stability and consistency during polishing, suitable for application scenarios with high requirements for processing uniformity and process repeatability.
Related product parameters:

For sample testing, please contact Engineer Wang at 13312961176 (same as WeChat).
05 TORAY KS09-1 Backing Pad
Performance upgrade, extending consumable service life
KS09-1 is a black backing pad with improved chemical resistance based on KS09, suitable for the polishing process of materials such as InP.
With superior chemical slurry resistance, KS09-1 can maintain a longer service life in pure chemical polishing and process environments with strong slurry corrosiveness.
TORAY KS09-1 backing pad product image:

Actual application effects:
Can reduce the performance decay of the backing pad caused by slurry corrosion, reduce replacement frequency, improve continuous production stability, and help lower overall consumable costs.
Related product parameters:

For sample testing, please contact Engineer Wang at 13312961176 (same as WeChat).
06 Four Core Products, Covering the Key Links of InP Polishing
From the KSTP-IP80 series' efficient rough polishing and backside polishing processes, to KSTP-SP20's surface fine optimization, to the stable support and chemical-resistance upgrade provided by the KS09 and KS09-1 backing pads, Kousei Seimitsu will continue to focus on the processing difficulties of InP materials and provide customers with more stable and efficient lapping and polishing products and process support.
We sincerely invite all industry partners to visit our booth and discuss InP material lapping and polishing technology and practical application solutions with us.
Exhibition Name: 2026 AI Computing Era: Indium Phosphide Material Innovation and Development Conference
Exhibition Time: August 7, 2026
Exhibition Venue: Jiangsu Wuxi · Suning Galaxy International Hotel
Booth Number: A22
BOSI Kousei Seimitsu looks forward to meeting you in Wuxi to explore new possibilities of InP precision processing together.
About Us
BOSI Kousei Seimitsu was founded in July 2022, focusing on integrated cutting, grinding, and polishing solutions in the precision processing field. It is an enterprise integrating equipment agency, consumable R&D, process customization, and import/export services. The company focuses on the semiconductor, precision optics, and special ceramics industries, providing stable and reliable one-stop services for high-end manufacturing through high-precision lapping, polishing, and cutting products and technical support, helping customers improve quality and efficiency.
Positioning: Full-process equipment and consumable provision and process solution development for the lapping and polishing industry.
Company business: Precision processing consumables and equipment, self-developed product R&D, and technical solution services.
Main business:
① Supply of production consumables such as thinning wheels, lapping and polishing slurries, polishing pads, and ceramic balls.
② Improvement of existing process solutions and R&D of new solutions in the lapping and polishing industry.
Deep-cooperation partners: internationally renowned enterprises such as NORITAKE, TORAY, and Sumitomo Chemical.